基本説明
The authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates, e.g. processes in which atoms of the growing film mimic the arrangement of the atoms of the substrate.
Full Description
Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy's coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization.
Contents
I. Basic Concepts.- 1. Introduction.- 2. Homo- and Heteroepitaxial Crystallization Phenomena.- 3. Application Areas of Epitaxially Grown Layer Structures.- II. Technical Implementation.- 4. Solid Phase Epitaxy.- 5. Liquid Phase Epitaxy.- 6. Vapor Phase Epitaxy.- 7. Molecular Beam Epitaxy.- 8. Metal Organic Vapor Phase Epitaxy.- III. In-situ Analysis of the Growth Processes.- 9. In-situ Analysis of Species and Transport.- 10. In-situ Surface Analysis.- IV. Physics of Epitaxy.- 11. Thermodynamic Aspects.- 12. Atomistic Aspects.- 13. Quantum Mechanical Aspects.- V. Heteroepitaxy.- 14. Heteroepitaxy; Growth Phenomena.- 15. Material-Related Problems of Heteroepitaxy.- 16. Closing Remarks.- References.- List of Abbreviations.- List of Metalorganic Precursors.
