Full Description
This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.
Contents
Introduction (J. Conrad).
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
