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基本説明
ダイアモンド膜の単結晶化・準結晶化を目指した、配向成長技術・ヘテロエピタキシャル成長技術に関する専門書。CVD法を用いたダイヤモンドの合成法にジャンする代表的論文や専門書467編を抽出し、その成果を要約。特に、高配向膜の合成と評価にはページを割いている。小橋宏司(神戸製鋼所 技術開発本部 電子技術研究所)著。
Full Description
Discusses the most advanced techniques for diamond growthAssists diamond researchers in deciding on the most suitable process conditionsInspires readers to devise new CVD (chemical vapor depositionEver since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Contents
1. Overview of Oriented Growth 2. Diamond - Structure and CVD Growth 3. Microwave Plasma CVD Reactors 4. Other CVD Reactors 5. Crystal Orientations and Film Surface Morphology 6. Formation of Twins 7. Homoepitaxial Growth 8. Surface Reconstruction 9. Epitaxial Growth on cBN, Ni, and Other Substrates 10. Diamond Nucleation 11. HOD Film Growth 12. Oriented Growth on Noble Metals 13. Properties and Applications of Heteroepitaxial Diamond Films 14. Conclusion APPENDICES Notations and unitsPlasmaProperties of diamond and other semiconducting materialsReconstruction of diamond surfacesMaterials constantsPhase diagrams of carbon and metalsCarbon solubilities in metalsBiasing and growth conditions for diamond growth